I´m looking for an elastomer/polymer formulation that can be UV-patterned to
form microstructures of 5-10um like a photoresist by spinning, softbaking, UV-
exposing, developing.

A modulus (E) of 3-8MPa would be great.

Strong adhesion to Au/epoxy surfaces, low dielectric constant, chemical
resistance and transparncy are desired properties.

Do anyone know of such a material and where it can be found?

Regards,

Patrik
Royal Institute of Technology
Stockholm
Sweden
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