Hi Patrik,  regarding Bill Moffat's comment : I guess polyimides need higher
temperatures than "softbaking".  HD 4000 is a negative tone polyimide from
HDMicroSystems ( www.hdmicrosystems.com)  Everything fits to your
application, but it is cured at 375C.

By the way, does anybody know a polyimide or another STABLE polymer that may
be used for surface passivation which has a cure temperature like a
photoresist?  Like 90C ?  I guess it is too low to break or form the
chemical bonds ?

Best regards,

Oray Orkun Cellek
Research Assistant, Ph. D. Student
Electrical & Electronics Engineering Department
Middle East Technical University
06531 Ankara
Turkey
Tel : +90 312 210 4579
Fax : +90 312 210 1261
e-mail : [email protected]

----- Original Message -----
From: "Bill Moffat" 
To: "General MEMS discussion" 
Sent: Tuesday, January 28, 2003 11:16 PM
Subject: RE: [mems-talk] um elastomer structures by UV patterning


> Patrik,
>        Sounds like a photo sensitive Polymide.  Note of caution the level
of Oxygen present when you bake the Polymide determines the transparency.
Bill Moffat
>
> -----Original Message-----
> From: Patrik Möller [mailto:[email protected]]
> Sent: Tuesday, January 28, 2003 8:27 AM
> To: [email protected]
> Subject: [mems-talk] um elastomer structures by UV patterning
>
>
> I´m looking for an elastomer/polymer formulation that can be UV-patterned
to form microstructures of 5-10um like a photoresist by spinning,
softbaking, UV-exposing, developing.
>
> A modulus (E) of 3-8MPa would be great.
>
> Strong adhesion to Au/epoxy surfaces, low dielectric constant, chemical
resistance and transparncy are desired properties.
>
> Do anyone know of such a material and where it can be found?
>
> Regards,
>
> Patrik
> Royal Institute of Technology
> Stockholm
> Sweden
> __
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