Check out the new photosensitive elastomer from Dow Chemical. Seems to fit
your needs.
Erik

-----Ursprüngliche Nachricht-----
Von: [email protected]
[mailto:[email protected]]Im Auftrag von Patrik Möller
Gesendet: Dienstag, 28. Januar 2003 17:27
An: [email protected]
Betreff: [mems-talk] um elastomer structures by UV patterning


I´m looking for an elastomer/polymer formulation that can be UV-patterned to
form microstructures of 5-10um like a photoresist by spinning, softbaking,
UV-exposing, developing.

A modulus (E) of 3-8MPa would be great.

Strong adhesion to Au/epoxy surfaces, low dielectric constant, chemical
resistance and transparncy are desired properties.

Do anyone know of such a material and where it can be found?

Regards,

Patrik
Royal Institute of Technology
Stockholm
Sweden
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