Hi All,
I am interesting in obtaining some SOI wafers with a buried silicon nitride
layer instead of an oxide layer. I have searched the net and it seems like there
are some research in progress making such SOI wafers by nitrogen implantation,
an alternative to the SIMOX process. Does anyone know if such SOI wafers are
commercial available?

I guess it should also be possible to fabricate buried nitride SOI wafer by
standard bonding and cleaving, but I have not been able to find any information
so far.

Regards,

Jamil El-Ali

Jamil El-Ali
Mikroelektronik centret, MIC
The Technical University of Denmark, DTU
Building 345 East
Dk-2800 Lyngby
Denmark

E-Mail: [email protected]
Direct phone: +45 45256319
fax: +45 45887762