Pan,
    You need to supply more details.  Are you looking for lift off, does your
sacrificial resist have to withstand any severe process before the sacrifice.
The answers depend upon the process you wish to use.  Bill Moffat

-----Original Message-----
From: [email protected] [mailto:[email protected]]
Sent: Tuesday, February 04, 2003 2:01 PM
To: [email protected]
Subject: [mems-talk] film thickness


Dear MEMS colleague:

I would like to use photoresist as sacrifical layer with required thickness
around 0.5 um in my fabrication process. Could you tell me what kind of
photoresist I should use and where I can find their process? Thank you very
much for your help.

Best Regards,

Pan Mao



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