A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Etching rate for BCB
Etching rate for BCB
2003-02-05
haixinzhu
2003-02-06
Lester Lopez
2003-02-10
Zhang Zhenfeng
2003-02-06
Bill Moffat
2003-02-10
Ivan Shubin
Etching rate for BCB
Bill Moffat
2003-02-06
Michael,
        The etch rate depends upon the temperature you can allow your device to
go to.  One of our customers is etching 8 microns of cured Polymide in 5
minutes.  He is using our 8" plasma resist stripper with 2Kw power.  What power,
temperature, pressure and plasma unit are you using.  He is using close to your
ratios of CF4 in his case I think it is 30%.  He is however using 250 degrees C.
He has a need to remove the Poly fast for production reasons and his devices are
not temperature sensitive.  Bill Moffat

-----Original Message-----
From: haixinzhu [mailto:[email protected]]
Sent: Wednesday, February 05, 2003 1:47 PM
To: [email protected]
Subject: [mems-talk] Etching rate for BCB


Dear all,

I am trying to etch BCB layer using 1:4 CF4/O2, anyone know the etching rate?

Thanks.

Michael
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Process Variations in Microsystems Manufacturing
MEMS Technology Review
Harrick Plasma, Inc.
Nano-Master, Inc.