Dear MEMS Colleagues,

I have a couple of questions:

1. Can anyone provide me with information regarding
target composition and sputtering parameters for Ni-Cr
(RF and DC) to achieve a TCR < 50ppm.

2. I am also experimenting with Si-Cr (to achieve high
value resistors), does anyone have any experience with
sputter deposition (DC and RF) of this material?

Thank you,
Regards,
Adnan Merhaba

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