Aluminum is good.  Before you use aluminum holder, first condition it with SF6
plasma forming a dense AlF3 layer. RIE without Bias Power will not damage AlF3.

Yinbao Yang

-----Original Message-----
From: George C. Lopez [mailto:[email protected]]
Sent: Wednesday, February 12, 2003 11:38 AM
To: [email protected]
Subject: [mems-talk] Moving samples in RIE


MEMS-talk colleagues:
        We are performing a long SF6 etch on some thin silicon carbide samples
on
a Plasma Therm 790 RIE.  After the etching process is done, I discover that
some of the samples have flipped over or have moved to the extreme edge of
the chamber where the plasma is less intense.  I'm thinking of making a
holder that has wells where I can place the samples and having sufficient
weight that keeps it fixed in location.  Which material can this holder be
made of, such that it would not create a loading effect on the SF6 etch and
would not redeposit onto my sample due to the plasma energy?

Much obliged,
George


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