Hi.  Here is a reference to a good journal article on the subject:

Raul Murete de Castro, Patrick Verdonk, Marcelo B. Pisani, Ronaldo
Domingues Mansano, Giuseppe Antonio Cirino, Homero Santiago Maciel and
Marcos Massi, "End-Point Detection of Polymer Etching Using Langmuir
Probes", IEEE Trans. On Plasma Science, Vol. 28, No.3, pp. 1043 - 1049,
June 2000

Sincerely,

Robert Dean

Auburn University

At 05:14 PM 2/19/03 -0800, you wrote:
>Hi, everyone,
>
>I am looking for some MEMS methods to monitor plasma
>in dry etching or other MEMS processing. Can anyone
>help me to find some reference about this?
>
>Thanks
>
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