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MEMSnet Home: MEMS-Talk: Residual Stress of Silicon Nitride
Residual Stress of Silicon Nitride
2003-02-21
Maximiliano Fischer
2003-02-22
Neal Ricks
2003-02-24
Dudi Banitt
2003-02-28
beaton@npphotonics (Bill Eaton)
2003-02-28
[email protected]
Residual Stress of Silicon Nitride
Dudi Banitt
2003-02-24
How do you measure the residual stress? Is it measured on a wafer level?
What would be the tolerances of the warp? Is it an issue that requires
incoming inspection on a sample basis? 100% inspection?

David Banitt - CEO
Nano-Or Technologies Ltd.
1 Yodfat St.
Lod 71291 Israel
Tel  +972 (0)8 9282801
Fax +972 (0)8 9282805
[email protected]

-----Original Message-----
From: Maximiliano Fischer [mailto:[email protected]]
Sent: Friday, February 21, 2003 8:51 PM
To: [email protected]
Subject: [mems-talk] Residual Stress of Silicon Nitride

Dear MEMS Specialists,

I really appreciate if you could help me find data on residual stresses
left in Silicon Nitride layers on usual and hi-quality wafers. For our
research, we would need to find very-low-stress nitride-layered wafers or
methods to create them by our own. Prices, availability and literature are
welcome.

Thanks!
--

_________________________________________________

Maximiliano Fischer
Eng MSc Aero & Astro
CNEA - UNSAM MEMS Group



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