Hello,

I am  working on a project where the use of bismuth is necessary. One of the
project steps is to etch the silicon with RIE. The bismuth is exposed to the
fluorine (plasma ICP of SF6). The idea is not to etch the bismuth but to
etch the silicon.

I would like to know if someone has used bismuth in the same conditions I
described above and might help me to find some information about the
reaction of the bismuth with SF6.

Thank you and I hope to hear some good news very soon.

Good bye.

Schahrazede Mouaziz.


Mouaziz Schahrazede

Laboratoire de Microsystèmes (LMIS1)
EPFL - STI - IMM - LMIS1
BM 3.217
1015 Lausanne
Switzerland

Tel:   +41 (0)21 693 67 42
Fax:   +41 (0)21 693 66 70

http://lmis1.epfl.ch