If I understand it correctly, you can fill the holes
with a PMMA or another filler material, planarize (lap
or polish) the wafer surface, and spincoat your resist
and pattern it. Once you are done with processing the
resist, you can go back and remove the filler
material.

Abhinav

--- sandhya sandhya  wrote:
>
> Hello
>
> I am sandhya, a research student . Can ,anyone say
> me how to apply photoresist(spin) on a wafer having
> holes in it and pattern them. we are using SPR 200
> series positive resist.
>
> Thanks
>
> sicerely,
>
> Sandhya

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