Dear all,

Does anyone know a tried and tested sputtering process for the deposition of
high quality thin-film insulating titanium dioxide layers (i.e. titania,
TiO2) on pre-metallized substrates (e.g. Pt/SiO2/Si?). We are looking to
deposit thin films ( about 1000A) having a high dielectric constant (80-100)
and a good insulating behaviour (i.e. very low leakage currents). In
addition, can anyone suggest a suitable metal underlayer which gives good
crystallization of the TiO2.

Yours sincerely,


Christian DRUON
IEMN (Institut d' Electronique, de Microelectronique et de Nanotechnologies)
Departement DHS
Cite scientifique
Avenue Poincare, BP 69
59652 Villeneuve d' Ascq Cedex, FRANCE
Tel: 03.20.19.79.62
Fax:03.20.19.78.80
email: [email protected]
http://www.iemn.univ-lille1.fr