Dear Christian,
Typically a Ti target with O2/Ar mixture would give good results. A 80/20
mixture would give you a slow rate of coating. You'd, however, need to anneal
the film afterwards at around 600oC in O2 for an hour or so to properly
cyrstalllize it. Alternately, if you use a hot substrate (~200oC) during
sputtering, you can avoid the annealing step. You'll have to charaterize the
specific time, temperature and vacuum level for your system.
Generally, sputtering is a hard method to get smooth films with high
stoichiometry, esp. for something like TiO2 which has a notorious oxygen vacancy
issue. I prefer to use a sol-gel method. I find that it can give very thin films
(~300 A) of very good quality. I've used them to make thin film capacitors and
barrier layers.
Hope this helps,
Regards,
Swaroop KAZA201 Marcus Hall,Dept. of Electrical and Computer Engg.University of
Massachusetts, AmherstAmherst, MA 01003Ph: (413) 545-4207Fax: (413)
545-4611email: [email protected]
 Mr Christian DRUON  wrote:Dear all,

Does anyone know a tried and tested sputtering process for the deposition of
high quality thin-film insulating titanium dioxide layers (i.e. titania,
TiO2) on pre-metallized substrates (e.g. Pt/SiO2/Si?). We are looking to
deposit thin films ( about 1000A) having a high dielectric constant (80-100)
and a good insulating behaviour (i.e. very low leakage currents). In
addition, can anyone suggest a suitable metal underlayer which gives good
crystallization of the TiO2.

Yours sincerely,


Christian DRUON
IEMN (Institut d' Electronique, de Microelectronique et de Nanotechnologies)
Departement DHS
Cite scientifique
Avenue Poincare, BP 69
59652 Villeneuve d' Ascq Cedex, FRANCE
Tel: 03.20.19.79.62
Fax:03.20.19.78.80
email: [email protected]
http://www.iemn.univ-lille1.fr



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