Hi, Christian

I sputtered TiO2 with Ar/N20 instead of Ar/O2, because it turned out that
the target gets oxidized. You need more N20 than O2 because it has to
fractioned in the plasma

150 sccm Argon
 50 sccm N20
200 Watt at 13,56 Mhz
2 nm/min deposition rate.


Hope that helps ...

Stefan.