I've used Cr as an adhesion layer for photoresist on Pyrex.  After
patterning the resist and etching the Cr, I etched the Pyrex with either
buffered oxide etch or SF6 plasma.  In the case of plasma etching, the Cr
acted as a mask, since the resist was gone long before I reached the desired
depth of 0.5 micron.

Roger Shile

----- Original Message -----
From: "Zhimin J Yao" 
To: 
Sent: Tuesday, March 11, 2003 11:59 AM
Subject: [mems-talk] mask material for wet etch glass


> Hi,
>
> We are trying to etch about 0.5 - 1mm deep into glass or quartz using a
> metal mask.  Au did not work well because the adhesion layer got etched.
> Does anybody know what metal works the best?  Anybody tried W?
>
> Thanks,
> Z. Jamie Yao
>
>
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