Thanks Greg, with adding a bit of CF4 into O2, it does help in cleaning
residue. I am also trying O2/Ar, which also give me some promising
results. I'll see which is the best conditions for my process. Thanks a
lot.


Isaac


On Thu, 13 Mar 2003, Greg Reimann wrote:

> I did a similar thing.  I assume that you are using a high power O2 plasma.
> I think that the SU-8 doesn't etch, but sputters down until it just can't
> any more.  You end up with a residue anywhere there was SU-8.  I got
> beautiful SU-8 etching with 20% CF4 80% O2 at low power (30W) for a long
> time.  No residue and relatively little etching of the Oxide substrate.  If
> the rest of your device can handle the CF4, I think this is the way to go.
>
> Good Luck
> Greg Reimann
>
>
>
> > Hi,
> >
> > May I add a question? I've tried to ash SU-8 with O2 plasma in
> > ICP/RIE system. But there is a film of residue on wafer. Have you seen
> > such problem?
> >
> > Isaac
> >
> >
> > On Fri, 7 Mar 2003 [email protected] wrote:
> >
> > > What type of reactor do you have? Is it a barrel asher or a single wafer
> system. OUr experience with oxygen and su8 shows it will ash but it is
> better if you have not done the second bake. This has been done in an
> icp/rie system and the etch rate is a little less than other negative
> working photoresists. Bob Henderson
> > >
> > > _______________________________________________
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> > >
> >
> > Yours sincerely,
> >
> > Isaac Chan
> >
> > Ph.D. Candidate
> > Dept. Electrical & Computer Engineering
> > University of Waterloo
> > 200 University Ave. W
> > Waterloo, Ontario, Canada
> > N2L 3V1
> > Tel: (519) 729-6409, ext. 6014
> > Fax: (519) 746-6321
> > [email protected]
> > http://www.ece.uwaterloo.ca/~a-sidic
> >
> >
> > _______________________________________________
> > [email protected] mailing list: to unsubscribe or change your list
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> > Hosted by the MEMS Exchange, providers of MEMS processing services.
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> >
>
>
> _______________________________________________
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> Visit us at http://www.memsnet.org/
>

Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3V1
Tel: (519) 729-6409, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic