hi
we are processing a negative photoresist in hight of 20 to 200 µm. with aspect
ratios over 1 we have problems with bridging.
did somone have a solution to solve this problem?
thanks for your help
Christoph Jakob
_________________________________
Jakob Christoph
Dipl. Ing. FH
Development Engineer Microparts
elmicron ag
Feldstrasse 1
Postfach 4030
CH-6304 Zug
phone: + 41 41 724 88 35
fax: + 41 41 724 88 89
e-mail: [email protected]
www.elmicron.ch
_________________________________
