Jakob,
      Image reversal may fix it.  The thickest resist we have worked with is 40
microns let me know if you need further information.  Bill Moffat

-----Original Message-----
From: Jakob Christoph [mailto:[email protected]]
Sent: Wednesday, March 19, 2003 7:55 AM
To: [email protected]
Subject: [mems-talk] bridging


hi

we are processing a negative photoresist in hight of 20 to 200 µm. with aspect
ratios over 1 we have problems with bridging.
did somone have a solution to solve this problem?

thanks for your help

Christoph Jakob

_________________________________

Jakob Christoph
Dipl. Ing. FH
Development Engineer Microparts

elmicron ag
Feldstrasse 1
Postfach 4030
CH-6304 Zug

phone:    + 41 41 724 88 35
fax:        + 41 41 724 88 89
e-mail:    [email protected]
              www.elmicron.ch
_________________________________





_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/