Dear Colleagues,

I have some questions on LIL (Laser Interference Lithography).
I am doing conventional LIL to achieve 200 nm pitch grating.
Could you tell me what kind of photoresist is best for this process?
Wavelength of the laser is 325 nm.
I am using SPR-508A from Shipley.
However, it is difficult to achieve good PR profile.
In addition, will ARC coating under PR be helpful for 200 nm pitch LIL?
Thank you in advance.

Sincerely,
Seh-Won