Dear Hong,

With respect to the compatibility of SU-8 to positive photoresists I can say
that as long as the SU-8 has been exposed and post-exposure baked there should
be no attack of the solvent in the PR on the cross-linked SU-8. However
depending on the solvent contained in the PR there could be some attack and even
development of the unexposed/uncrosslinked regions of the SU-8, potentially
creating a new species and causing scumming during development of the imaged
PR...

If you would like to discuss this in greater detail please do not hesitate to
contact me.

Mark Shaw
Technical Sales & Applications Support
MicroChem Corp.

email: [email protected]
url: www.microchem.com