Hi Everyone,
I am trying to do a deposition of silicon nitride, at room temperature , which
is very vital for my research project. The temperature that would suit the
deposition is 300 degrees. I ve done the deposition at 300 successfully. I want
to know how I could deposit the film at room temperature, or at a max 70. One of
the Suggestions that i ve received is to increase the rf power. but before
advancing i would like to get some suggestions from people if they have done
this before.
thanks and regards,
Gowtham Vangara,
Graduate Research Assistant,
Department of Electrical Engineering,
High Density Electronic Center(HiDEC),
University Of Arkansas,
Fayetteville, AR 72701