Dear Virginia,
what is wrong with the H2O2? It should not attack Al
as it will passivate it first and gold should be also
inert.
Other option (not wet) might be SF6 plasma or XeF2
vapors. In case you are interested to try out the
latest one, why do not just send us your samples and
we will etch them for you free of charge. It is normal
service we offer to out clients to try outs (few
samples, not hundreds of wafers, of course).
Best Regards
Pavel


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Pavel Neuzil
CTO SiMEMS Pte Ltd

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