Hi all,

    I have tried to etch a polymer layer by means of plasma etching and used
PR(AZ5214E) as mask. However, I found that the PR is not easily washed away by
acetone after plasma etching. When the PR is dipped under acetone, it turns into
many small pieces and stick on the substrate. Why?  Have you met this problem?
is it the power of the RF too large (60W)?  Or what?  Please help..

Thank you very much!

Best regards,
Hoyin