Hi all,

    I have tried to etch a polymer layer by means of plasma etching and
used PR(AZ5214E) as mask. However, I found that the PR is not easily
washed away by acetone after plasma etching. When the PR is dipped under
acetone, it turns into many small pieces and stick on the substrate. Why?
Have you met this problem? is it the power of the RF too large (60W)?  Or
what?  Please help..

Thank you very much!

Best regards,
Hoyin