Hi,
The plasma acts like UV bake on the resist and causes it to crosslink.
try microstrip or such for resist removal. Also exposing the resist after
develop and before hardbake could help.
Shay

Chan Ho Yin wrote:

> Hi all,
>
>     I have tried to etch a polymer layer by means of plasma etching and
> used PR(AZ5214E) as mask. However, I found that the PR is not easily
> washed away by acetone after plasma etching. When the PR is dipped under
> acetone, it turns into many small pieces and stick on the substrate. Why?
> Have you met this problem? is it the power of the RF too large (60W)?  Or
> what?  Please help..
>
> Thank you very much!
>
> Best regards,
> Hoyin
>
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/