I did some work a few months ago on wet etching polyimide as a release process
rather than for patterning.  After extensive searching we finally identified an
etch which would remove the polyimide. The results were mixed, however, and the
etch we found was very aggressive.  Careful thought must be given to the other
layers on the wafer when using the etch, so it may not suit your needs.

Although I haven't given up completely with the wet etch, a dry  etch is much
easier to control and is more production friendly. There  have been postings in
the past on dry etching which you can find in the  archives.

An alternative could be to use a photosensitive polyimide which you can pattern
and develop.  We have used PI2723 from HD Microsystems for several years and are
very happy with the results.  ( www..hdmicrosystems.com/conn/offices.html  for
contact details).

If you could give more details of the process you are running I may be able to
offer a few tips.

Andy Scholes, Ph.D.
Utvecklingsingenjör
ACREO AB
SE 164 40 Kista
Sweden

>>> [email protected] 04/12/03 03:34am >>>
Dear All,

Does anybody happen to know about the wet-etching of
polyimide? Is there any "standard" etchant to wet-etch
polyimide layers?

Appreciating any hint,
Sh.Farhangfar

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