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  • IC editing (Aristides Requicha)
  • RE: Supplier of XeF2 etching equipment? (Geng Chen)
  • SU-8 photoresist FAQ (Franck CHOLLET)
  • Re: What's the rule of isotropic etching? (Lee Jia-Hong)
  • MEMS-based timer (KEENE, DAVE)
  • Carbon Dioxide sensor wanted ([email protected])
  • Re: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum (Tom Wester)
  • Re: Boron Etch Stop (Dan W Chilcott)
  • 8-inch silicon wafer processing needed! ([email protected])
  • Re: Etching Mask for BSG(Corning 7740)? (John Klemic)
  • Re: Q factor (Lawrence C. Gunn)
  • Re: Etching Mask for BSG(Corning 7740)? (Jayant Neogi)
  • Re: Newsgroup? (Robert Okojie)
  • Re: Newsgroup? (Robert Okojie)
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Process Variations in Microsystems Manufacturing