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  • Electro-chemical etch stop (Raymond Chong)
  • Nickel thin film deposition on silicon dioxide (kanishka biswas)
  • Silicon etching rates in KOH solutions at different Concentrations and TEmperatu (kanishka biswas)
  • LPCVD Nitride (Liz Shelley)
  • film deposition (Steven Gross)
  • film deposition (Robert Okojie)
  • film deposition (Kenneth Smith)
  • BCB properties (Randall Cha)
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Harrick Plasma
Tanner EDA
The Branford Group
Process Variations in Microsystems Manufacturing
Tanner EDA by Mentor Graphics
Harrick Plasma, Inc.