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  • spin photoresist after releasing the structure (Yong Zhu)
  • ion implanter foundry service ([email protected])
  • Far IR emissivity of silicon and silicon nitride ([email protected])
  • spin photoresist after releasing the structure (Brubaker Chad)
  • Re: mems-talk digest, Vol 1 #55 - 5 msgs (Craig McGray)
  • young's modulus,compliance coeff, poission ratio ofSi in <110> direction ([email protected])
  • resistivity values of TaN and TiW (Adnan Merhaba)
  • Nanopowder Custom Synthesis (Cindi Prorok)
  • Fw: Re: Furnaces or Autoclave for Small Lab (Jiangang Du (John Duke))
  • RE: Gold Electroplating (Mark Shaw)
  • Re: electroplating gold (eddy)
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