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  • Re: ion implant depth vs energy for As, B, etc (lucia beccai)
  • Thick SU8 Problems (Kevin Banks)
  • stressed membrane simulation using ANSYS (il-seok son)
  • mask pattern TMAH etching ([email protected])
  • How to reduce Undercuts for quartz etching? (Roger Shile)
  • Etch oxide not Aluminum? (Yahong Yao)
  • Etch oxide not Aluminum? ([email protected])
  • wire bonding on top of Polysilicon (Yong Zhu)
  • looking for method of sharpening single crystal silicon tip (yangzunxian)
  • High resistivity Silicon wafer (Wang Shijie)
  • wetability of chromium oxide (overmach)
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