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  • Information about etching silicon in KOH using wax as a protective layer (kanishka biswas)
  • Reduction of Wafer Size Needed (Frank Rasmussen)
  • Silicon etching (George Diercks)
  • AutoCAD problems with mask design (Jens Tuchscheerer)
  • Re:etch Si(110) and Si(100) in KOH (George Diercks)
  • SU-8 chemical compatibility (Charles Lakeman)
  • Re:etch Si(110) and Si(100) in KOH (Wen H. Ko)
  • Re: AutoCAD problems with mask design (Pancham R. Patel)
  • Re:etch Si(110) and Si(100) in KOH ([email protected])
  • etch Si(100) and Si(110) wafer using KOH (Onnop Srivannavit)
  • Reduction of Wafer Size Needed ([email protected])
  • Miniature vacuum pressure transducer (Rick Y Chang)
  • SU-8 chemical compatibility (BERAUER,FRANK (HP-Singapore,ex7))
  • Enquiries on commertial foundries for surface micromaching, high reflectivity and small roughness ar (Zhang JingBo)
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