A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk
..
  • Information about etching silicon in KOH using wax as a protective layer (kanishka biswas)
  • Reduction of Wafer Size Needed (Frank Rasmussen)
  • Silicon etching (George Diercks)
  • AutoCAD problems with mask design (Jens Tuchscheerer)
  • Re:etch Si(110) and Si(100) in KOH (George Diercks)
  • SU-8 chemical compatibility (Charles Lakeman)
  • Re:etch Si(110) and Si(100) in KOH (Wen H. Ko)
  • Re: AutoCAD problems with mask design (Pancham R. Patel)
  • Re:etch Si(110) and Si(100) in KOH ([email protected])
  • etch Si(100) and Si(110) wafer using KOH (Onnop Srivannavit)
  • Reduction of Wafer Size Needed ([email protected])
  • Miniature vacuum pressure transducer (Rick Y Chang)
  • SU-8 chemical compatibility (BERAUER,FRANK (HP-Singapore,ex7))
  • Enquiries on commertial foundries for surface micromaching, high reflectivity and small roughness ar (Zhang JingBo)
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Nano-Master, Inc.
Mentor Graphics Corporation
Process Variations in Microsystems Manufacturing
University Wafer