A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk
..
  • Fatigue testing of micro-components (Ertl, Stephan)
  • Cr dry etch service (Marc A F van den Boogaart)
  • RIE etch of silicon nitride (PR mask?) ([email protected])
  • Information on ZEP (Jean Tokarz)
  • RIE etch of silicon nitride (PR mask?) (Michael D Martin)
  • Low stress and thin Au-Ti film ([email protected])
  • Re: DRIEetch of highly doped silicon wafers (Masa Rao)
  • Top-channell MOSFET (SERGEI V KALININ)
  • Aluminum grain size (Fabio Altomare)
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Tanner EDA by Mentor Graphics
Addison Engineering
Process Variations in Microsystems Manufacturing
Nano-Master, Inc.