A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk
..
  • Boron diffusion and activation (CHEW SOON AIK)
  • hydrophobic gold (lakshmikanth namburi)
  • selective Cu/Ag etchant (Schuurman, Gilbert)
  • PMMA resist adhesion in wet etching. (Sampo Tuukkanen)
  • Glass-Glass Direct Bonding (Helen Li)
  • Re: Boron diffusion and activation (Albert K. Henning)
  • Etching of Si with Tungsten as mask (changhong ke)
  • Where can I buy a kind of thioether glycidyl resin? (Ren Yang)
  • PMMA resist adhesion in wet etching. (Bill Moffat)
  • Echant for Anisotropic Etching of Si with Tungsten as mask (changhong ke)
  • Shipley1813 on su-8 (Soojin Oh)
  • hydrophobic gold (Bill Moffat)
  • thick photoresist for dry etching ([email protected])
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Addison Engineering
Tanner EDA by Mentor Graphics
The Branford Group
Mentor Graphics Corporation