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  • Re: Buried silicon nitride (Tanya Snyder)
  • Re: Wet Si etchant not attack Al and/or SiO2 (HE,Han-Johnny)
  • Re: +AFs-mems-talk+AF0- RE: +AFs-mems-talk+AF0- Wet etchant not attack Al and SiO2 (Sunil Kumar)
  • dry etch indium oxides and tin oxides (Michael Yakimov)
  • PZN-PT Or PMN-PT target materials (Shankar R. Ghimire)
  • Photopatterning (Abhinav Bhushan)
  • How to easily control the thickness of SU-8 coating? (Kailiang Wang)
  • crystalline direction alignment (Hongjun Zeng)
  • Chromium Wet Etching (Phillipe Tabada)
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