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  • What could be wafer surface temperature during sputter deposition w/ Al deposition, 10000W, 150sccm Ar flow, 12min deposition time? (Cheol Han)
  • Deposition of PbS by electron beam evaporation (wei chong)
  • MEMS testing (Ahmad Mobashar)
  • Help with AZ5214 Info (Joolien Chee)
  • SU-8 adhension problem (Matthieu Gaudet)
  • 2 level SU-8 lithography (Matthieu Gaudet)
  • RE: Glass substrate supplier (Carsten Wesselkamp)
  • HELP: Sputtered Tin oxide dry etching (Giovanni Morelli)
  • 2 level SU-8 lithography (Josef Kouba)
  • 1 mm thick mirco mechanical structure ([email protected])
  • Glass substrate supplier (Josef Kouba)
  • SOI wafer (Chunchen Lin)
  • High Series Resistance Schottky diode (Jean-Marc ROLLIN)
  • dry photoresist film (Bill Moffat)
  • Potassium ferricyanide (Shweta Humad)
  • HELP: Sputtered Tin oxide dry etching (Bill Moffat)
  • SU-8 adhension problem (Matthieu Gaudet)
  • dry photoresist film (Matthieu Gaudet)
  • Double Layer Effects on the Effective Dielectric Constant (paul safier)
  • Metallization and SEM services (Ram K. Trichur)
  • Source for plastic materials (Reiner Witte)
  • High temperature behaviour of Silicon (Shay Kaplan)
  • Help needed with solent semiconductor reflow oven ([email protected])
  • Help with AZ5214 Info (Oray Orkun Cellek)
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