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  • SU-8 adhesion problem ([email protected])
  • SU8 Information (Brubaker Chad)
  • Line Edge Roughness (Brubaker Chad)
  • TLM structure for measuring the specific contact resistance (hare krishna)
  • Ti thin film resistivity (Anna Ohlander)
  • dry photoresist film (Regan Nayve)
  • surface roughness of su8 (Chen-Han Lee)
  • Conductive substrates for processing SU-8 (Mark Leonard)
  • Conductive substrates for processing SU-8 (Michael D Martin)
  • Conductive substrates for processing SU-8 ([email protected])
  • SU-8 adhesion problem (Karin Buchholz)
  • Ti thin film resistivity (MT Klaus Beschorner)
  • Ti thin film resistivity (Kirt Williams)
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