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  • InGaAs diffusion using spin-on silica source (Abang Annuar Ehsan)
  • Alternative developer for AZ9260 (Sanjay Vijendran)
  • Silicon nitride passivation (John Maloney)
  • Dry etching GaAs (Brent Garber) (2 parts)
  • Wafer Orientation (Kenneth Smith)
  • resist and adhesion layer (Sebastian Sosin)
  • modeling of negtive resist (Peng Yao)
  • RE: Dry etching GaAs (Michael Marrs)
  • Re: Re: STS ASE etch help (ShuTing)
  • RE: Glass trench etch (Michael Marrs)
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