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  • Anisotropic Si wet etching (Bruno Wacogne)
  • etch rate of LPCVD Silicon Dioxide (Qing Yao)
  • Generating fine dots for Photogrammetry (Robert Black)
  • refraction index of LPCVD silicon dioxide (Qing Yao)
  • refraction index of LPCVD silicon dioxide (X. Yuan)
  • refraction index of LPCVD silicon dioxide (Shile)
  • refraction index of LPCVD silicon dioxide (Michael D Martin)
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Process Variations in Microsystems Manufacturing