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  • back etching of Si--once more (Su Yufeng)
  • Unstable Plasma - Dry Etching (Robert Lindegren)
  • photoresist layer for protecting biomolecule during oxygen plasma (WANG,HONG)
  • Mask for H2O2 (Tomi Meilahti)
  • Problems with PDMS to PDMS bonding (Vishwanath Somashekar)
  • Problems with PDMS to PDMS bonding (Z.,W.Y.(Lydia))
  • Problems with PDMS to PDMS bonding (Paul Monaghan)
  • Unstable Plasma - Dry Etching (Capps, Scott)
  • Unstable Plasma - Dry Etching (Frank Torregrosa)
  • Unstable Plasma - Dry Etching (William Lanford-Crick)
  • PDMS-Polystyrene(PS) bonding (Tae-Gon Kim)
  • Anodic bonding Glass/SOI/Glass (John Kubby)
  • photoresist layer for protecting biomolecule duringoxygen plasma (Adrian Brozell)
  • Photoresist pattern on PDMS (Hongjun-ECE)
  • AFM Inquiry ([email protected])
  • wet chemical etch of liquid crystal polymer (LCP) (varun keesara)
  • IPC etching mask (Lu Carol)
  • indium plating ([email protected])
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