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  • SU-8 on 6 inch wafers & PDMS casting trays (Brubaker Chad)
  • KOH etching (D. Zhou)
  • Using pre-deformed mesh in CoSolve (Coventor) (Maryna Lishchynska)
  • Polyimide Release Agent (erkin seker)
  • KOH etching (Dr Michael Cooke)
  • Non-photoactive resist (Parijat Bhatnagar)
  • Polyimide Release Agent (Michael D Martin)
  • KOH etching (Lipson, Ariel)
  • Polyimide Release Agent (Oliver Horn)
  • reg: spin on glass (Glenn Silveira)
  • KOH etching (ZICKAR Michaël)
  • inquire about Parylene coating system? (Xiaotong Gao)
  • SU-8 on 6 inch wafers & PDMS casting trays (Dwayne Dunaway)
  • Polyimide Release Agent (Dr Michael Cooke)
  • Non-photoactive resist (Isaac Wing Tak Chan)
  • Using pre-deformed mesh in CoSolve (Coventor) (Ale)
  • Beam cadence pcells (Peregudov, Dmitriy)
  • Polyimide Release Agent ([email protected])
  • DRIE Etch Stop (Ashish Chaudhary)
  • PDMS question ([email protected])
  • Non-photoactive resist (Robert Black)
  • Particle sticking within PDMS microchannels (Jeff Zahn)
  • PDMS question (Hongjun-ECE)
  • PDMS question (karim faid)
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Process Variations in Microsystems Manufacturing