A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk
..
  • Question about the mask for RIE etching (Eric TANG Xiaosong)
  • image reversal photoresist AZ 5214 (Carel Heerkens)
  • Wet etchant for fluoropolymer (Arun Kumar)
  • BOE chemical composition (Rupesh Sawant)
  • RIE: Vertical sidewalls, anisotropic, and isotropic etching on SiON (silicon oxy-nitride), silica or Si3n4, (Haoling Liu)
  • Hot press for microfluidic structures (Brubaker Chad)
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Addison Engineering
University Wafer
Process Variations in Microsystems Manufacturing
The Branford Group