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  • Question about the mask for RIE etching (Eric TANG Xiaosong)
  • image reversal photoresist AZ 5214 (Carel Heerkens)
  • Wet etchant for fluoropolymer (Arun Kumar)
  • BOE chemical composition (Rupesh Sawant)
  • RIE: Vertical sidewalls, anisotropic, and isotropic etching on SiON (silicon oxy-nitride), silica or Si3n4, (Haoling Liu)
  • Hot press for microfluidic structures (Brubaker Chad)
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