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  • RE: Any preference for ITO deposition method? (Harald Walter)
  • Patterning SU-8 for DRIE process (Hongjun-ECE)
  • anisotropic etching of glass (Brent Garber)
  • Honeywell SOG 512B Etching Recipe with LPCVD Silicon Nitride Selectivity (Abdel Moneim Marzouk) (Abdel Moneim Marzouk)
  • Honeywell SOG 512B Etching Recipe with LPCVD SiliconNitride Selectivity (Abdel Moneim Marzouk) (Ad Hall)
  • Need help on DC sputtering parameters (Trang Q. Lam)
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