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make the su-8 surface flat (Khaled Mohamed Ramadan)
residual stress vs. thin film thickness (zhijian)
make the su-8 surface flat (Shane GUO)
residual stress vs. thin film thickness (Ruiz, Marcos Daniel (SENCOE))
Boron Nitride over SiO2 on Silicon wafers. (Ken Smith)
Etching 200 nm into a Saphirre Wafer (G. Puebla-Hellmann)
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