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  • Sputtered oxide as KOH anisotropic wet etching mask (Morrison, Richard H., Jr.)
  • AZ5214E as positive resist (Yingnan Wang)
  • AZ5214E as positive resist (Yingtao Tian)
  • AZ5214E as positive resist (Shay)
  • AZ5214E as positive resist (Enrique San AndrĂ©s)
  • AZ5214E as positive resist (Jin Yu)
  • AZ5214E as positive resist (Wei Cheng)
  • AZ5214E as positive resist (Felix Lu)
  • mems development software (Serhat Sevli)
  • mems development software (Shiv GD)
  • Sputtered oxide as KOH anisotropic wet etching mask (Kirt Williams)
  • Sputtered oxide as KOH anisotropic wet etching mask (Ruiz, Marcos Daniel (SGNCOE))
  • Sputtered oxide as KOH anisotropic wet etching mask (Tim Eschrich)
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