Material: Titanium Nitride (TiN), film

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Property↑↓	Value↑↓	Conditions↑↓	Reference↑↓
Poisson's Ratio	0.25	Thickness of 1.25 um,using magnetron sputtering technique Voltage= -65V,magnetron current=7.5A,Gas press(Argon)=0.3Pa,temp=250-300C	Thin Solid Films,270(1995), p.266
Young's Modulus	600 GPa	Thickness of 1.25 um,using magnetron sputtering technique Voltage= -65V,magnetron current=7.5A,Gas press(Argon)=0.3Pa,temp=250-300C	Thin Solid Films,270(1995), p.266
Young's Modulus	380 .. 450 GPa	Obtained from laser induced ultra sonic surface wave method for a thickness of 0.8-3.5um,choosing an intermediate density.	Thin Solid Films 290-291(1996), p.309
Young's Modulus	260 .. 350 GPa	Obtained from laser induced ultrasonic surface wave method for a thickness of 2.1-4 um,choosing an intermediate density.	Thin solid films 290-291(1996), p.309