chrome as a protectitive layer in TMAH etching of silicon
Vladimir Kutchoukov
2002-02-04
Dear MEMS members,
It has been reported that 40nm Cr can be used as a mask to etch silicon in
KOH solution, capable of withstanding the KOH for at least 12h:
http://galaxy.micro.uiuc.edu/facilities/processes/etching/silicon_cr_in_koh.
html
I am curious if Cr can be used as a mask to etch silicon in TMAH solution.
Has somebody an experience with Cr as an etching mask in TMAH?
Thanks a lot,
Vladimir