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  • heavy-duty magnetic stirrer (Yanjun Tang)
  • admissible stress of SiC,Si3N4 (Liu X.F.)
  • photoresist mask for KOH etching ([email protected])
  • su-8 and diamond (Deilton Reis Martins)
  • low-stress ZnO (Raegan Johnson)
  • su-8 and diamond (Shay Kaplan)
  • Selectivity of PR, SiO2, Si3N4 to Si in DRIE process (Pradeep Dixit)
  • photoresist mask for KOH etching (William Lanford-Crick)
  • Silicon etching (Nik Dee)
  • Silicon etching (Brent Garber)
  • Silicon etching (Wilson, Thomas)
  • Silicon etching (Jesse D Fowler)
  • Quick Test of Silicon orientation (Christoph Wild)
  • Adhesion problem of SU-8 on metal surface (Rob Hardman)
  • Ohmic contact (leo Won)
  • Quick Test of Silicon orientation (Kenneth Smith)
  • Cr as resistor (Behraad Bahreyni)
  • AZ photoresists (Ramon F. Figueroa)
  • CLC 1010 steel ([email protected])
  • Photoresist Spinners (Jessica Melin)
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